Photomask
Photomask is a key component in the manufacture of integrated circuits (ICs), which is used to transfer design patterns to silicon wafers to form circuits. The production of the light mask involves complex processes, including pattern design, exposure, development, etching and other steps to ensure that the pattern on the light mask accurately corresponds to the design and meets the needs of subsequent etching processes.
In principle, its process is very similar to that of traditional photos. The light mask is used as a negative. Under the exposure of the yellow light machine, the design pattern engraved on the light mask is repeatedly exposed on the wafer. The steps of IC manufacturing are: film → light resistance →development → etching → light resistance removal, and then continuous cycle dozens of times, each cycle, once the exposure process is required, the light cover needs to be placed in the exposure machine to define the graphics of the exposure area.
ASMO Technology is the first choice for the production of light mask precision. Total Solution (whole process service) provides you with a full range of light mask design and production solutions, with accuracy requirements of 2um - 0.25um.
In addition to providing yellow light equipment such as light mask alignment exposure machine, the company also provides process materials. In particular, the production of light mask is an important part of it. The size of the light mask can be from 4", 5", 6" to 24" × 32", among which it can also provide copy sub-piece services such as 4", 5", 6", 7", etc. Major LED, Discrete components, MEMS, Optoelectronics, etc.